@article{article, title = {{Low-temperature (鈮�600 掳C) semi-insulating oxygen-doped silicon films by the PECVD technique for large-area power applications}}, url = {{}}, year = {{1995}}, month = {{1}}, author = {{Clough FJ and Brown AO and Madathil SNE and Milne WI}}, doi = {{10.1016/0040-6090(95)06834-1}}, volume = {{270}}, journal = {{Thin Solid Films}}, issue = {{1-2}}, pages = {{517-521}}, note = {{Accessed on 2025/05/29}}}