TY - JOUR T1 - Low-Dimensional Waveguide Grating Fabrication in GaN with Use of SiCl4/Cl-2/Ar-Based Inductively Coupled Plasma Dry Etching JO - J ELECTRON MATER PY - 2009/05/01 AU - Dylewicz R AU - Patela S AU - Hogg RA AU - Fry PW AU - Parbrook PJ AU - Airey R AU - Tahraoui A ED - DO - DOI: 10.1007/s11664-009-0731-5 VL - 38 IS - 5 SP - 635 EP - 639 Y2 - 2025/07/05 ER -